Capacitively coupled plasma: Difference between revisions
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A '''capacitively coupled plasma (CCP)''' is one of the most common types of industrial [[plasma reactor]]s. It essentially consists of a two metal [[electrode]]s separated by a small distance, placed in a reactor. The gas pressure in the reactor can be lower than atmosphere or it can be [[Atmosphere (unit)|atmospheric]]. |
A '''capacitively coupled plasma (CCP)''' is one of the most common types of industrial [[plasma reactor]]s. It essentially consists of a two metal [[electrode]]s separated by a small distance, placed in a reactor. The gas pressure in the reactor can be lower than atmosphere or it can be [[Atmosphere (unit)|atmospheric]]. |
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A typical CCP is driven by a single [[Radio frequency|radio-frequency]](RF) power supply, typically at 13.56 MHz. One of these two electrodes is connected to the power supply, and the other one is [[Ground (electricity)|grounded]]. As this configuration is similar in principle to a [[capacitor]] in an electric circuit, the plasma is called a capacitively coupled plasma. |
A typical CCP is driven by a single [[Radio frequency|radio-frequency]] (RF) power supply, typically at 13.56 MHz. One of these two electrodes is connected to the power supply, and the other one is [[Ground (electricity)|grounded]]. As this configuration is similar in principle to a [[capacitor]] in an electric circuit, the plasma is called a capacitively coupled plasma. |
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When an [[electric field]] is generated between electrodes, [[electron]]s in the gas respond to the field and acquire energy. [[Ion]]s, being heavier, acquire less energy. The gas can also be heated via collisions with electrons. |
When an [[electric field]] is generated between electrodes, [[electron]]s in the gas respond to the field and acquire energy. [[Ion]]s, being heavier, acquire less energy. The gas can also be heated via collisions with electrons. |
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Revision as of 07:30, 30 November 2006
A capacitively coupled plasma (CCP) is one of the most common types of industrial plasma reactors. It essentially consists of a two metal electrodes separated by a small distance, placed in a reactor. The gas pressure in the reactor can be lower than atmosphere or it can be atmospheric.
A typical CCP is driven by a single radio-frequency (RF) power supply, typically at 13.56 MHz. One of these two electrodes is connected to the power supply, and the other one is grounded. As this configuration is similar in principle to a capacitor in an electric circuit, the plasma is called a capacitively coupled plasma.
When an electric field is generated between electrodes, electrons in the gas respond to the field and acquire energy. Ions, being heavier, acquire less energy. The gas can also be heated via collisions with electrons.
This leads to what is known as "avalanche breakdown". After breakdown, the gas becomes electrically conductive due to abundant free electrons. In normal cases, it also starts emitting light . When visible light is emitted from excited atoms or molecules in the gas, plasma generation can be indirectly observed even with bare eyes.
CCPs have wide applications in the semiconductor processing industry for thin film deposition.
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